P1-12 Oxidative-stress Resistance Response of Listeria monocytogenes and Its Cross Functionality against Lethal Processing Treatments

Monday, July 29, 2013
Exhibit Hall (Charlotte Convention Center)
Piumi Abeysundara, Mississippi State University, Mississippi State, MS
Kamlesh Soni, Mississippi State University, Mississippi State, MS
Ramakrishna Nannapaneni, Mississippi State University, Mississippi State, MS
Introduction: Listeria monocytogenes (Lm) is capable of oxidative stress response upon pre-exposure to a sublethal H2O2 which allows it to survive subsequent lethal H2O2 stress. There is no knowledge on the effect of series of other sublethal stresses in combination with oxidative stress on the survival of Lm under lethal inactivation treatments.

Purpose: Determine the oxidative stress adaptive response in Lm serotypes 1/2a and 4b when cells were pre-exposed to a single or a series of sublethal stresses and their subsequent resistance to lethal H2O2, acid, alkaline and antimicrobials.

Methods: Concentrations of H2O2 and pre-exposure times were determined for the formation of oxidative-stress resistant phenotype of Lm which was detected by its survival in lethal 1000 ppm H2O2 at 37°C or 25°C. Lm cells pre-exposed to a sequential sublethal stresses (alkali pH of 9 followed by 50 ppm H2O2 for 30 min in TSBYE) were compared with that cells pre-exposed to a single sublethal stress for their subsequent cross resistance to lethal stresses (pH 3.5, pH 11.75, 60 °C,  and QAC 2.5 or 5ppm).

Results: The oxidative stress resistant phenotype of Lm was induced when Lm cells were exposed to 50 ppm H2O2 for 30 min at 25°C and 37°C in TSBYE. When Lm cells were pre-exposed to sublethal alkali (pH 9) followed by sublethal H2O2 (50 ppm), it resulted in a phenotype that exhibited a greater survival in 1000 ppm of H2O2 by more than 4 log CFU/ml than the cells that were pre-exposed to sublethal H2O2 (50 ppm) alone.  Also, sequential alkali- oxidative sublethally stressed cells of Lm exhibited greater resistance against both lethal alkali (pH 11.75) and QAC (5 ppm).

Significance: Highly stable oxidative-stress and alkali-stress resistant phenotype of Lm is formed when cells were pre-exposed to mild alkaline stress which was not known previously.